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    Titanium Sputtering Target
    • Multiple Alloy Grades Available

    • Custom Diameters & Lengths

    • Worldwide Fast Direct Shipping

    • High Density Structural Metal

    Titanium Sputtering Target

    Titanium Sputtering Target Description

    Features:
    Titanium sputtering targets offer high purity, excellent corrosion resistance, and superior conductivity, making them ideal for a range of advanced applications in electronics, optics, and coatings. Titanium’s strength and excellent machinability ensure consistent deposition and high-quality thin films. These sputtering targets are specifically designed for use in high-performance environments, providing reliable and stable performance in demanding conditions.

    Applications:
    Titanium sputtering targets are widely used in industries such as:

    • Electronics: Used for thin-film deposition in semiconductors, capacitors, and microelectronics to enhance electrical performance and reliability.
    • Aerospace: Applied in the production of durable, corrosion-resistant coatings for aircraft components and high-performance alloys.
    • Optical Coatings: Ideal for coatings in optical instruments, lenses, and mirrors, providing enhanced reflectivity and durability.
    • Solar Cells: Used for the deposition of titanium layers in photovoltaic devices, contributing to energy-efficient technologies.

    Miji Magnesium provides a variety of titanium sputtering targets in different grades and specifications, and we can also custom-produce titanium alloy products according to your requirements. For inquiries, please contact: sales@mijimg.com.

    Titanium Sputtering Target Ti Grade 1

    Ti Grade 1 sputtering target, high-purity and corrosion-resistant, ideal for thin films, electronics, and optical coating applications.

    Titanium Sputtering Target Ti Grade 2

    Ti Grade 2 sputtering target, strong and corrosion-resistant, ideal for semiconductor, aerospace coatings, and high-performance thin-film deposition.

    Titanium Sputtering Target Ti Grade 5

    Ti Grade 5 sputtering target (Ti-6Al-4V), high strength and wear-resistant, ideal for aerospace coatings and advanced thin-film applications.

    Titanium Sputtering Target Ti Grade 7

    Ti Grade 7 sputtering target, palladium-alloyed for superior corrosion resistance, ideal for chemical processing, electronics, and thin-film coatings.

    Applications & Global Partners

    Toyota
    Toyota

    BMW
    BMW

    Ford
    Ford

    Mercedes
    Mercedes

    Bull
    Bull

    Dell
    Dell

    ELEK-TEK
    ELEK-TEK

    Intel
    Intel

    Applicantion Of Titanium Sputtering Target

    Integrated Circuits & Microelectronics
    Integrated Circuits & Microelectronics
    High-purity titanium sputtering targets engineered for thin-film deposition in semiconductors, diffusion barrier layers, gate electrodes, and microelectronic interconnects.
    Hard Wear Coatings & Decorative PVD
    Hard Wear Coatings & Decorative PVD
    High-density titanium targets widely used in Physical Vapor Deposition (PVD) systems to form TiN, TiCN, and TiAlN wear-resistant coatings on cutting tools, automotive parts, and consumer hardware.
    Optical Coatings & Display Panels
    Optical Coatings & Display Panels
    Precision titanium targets utilized for transparent conductive oxides, anti-reflective coatings, touch screen sensors, and thin-film transistor (TFT-LCD / OLED) display panels.

    FAQ

    Q: What purity levels are available for your titanium sputtering targets?
    A: We provide high-purity titanium targets ranging from 99.9% (3N) for functional industrial PVD hard coatings up to 99.995% (4.5N) and 99.999% (5N) ultra-high purity grades for semiconductor and microelectronic thin-film deposition.
    Q: What target geometries and custom dimension options do you produce?
    A: We offer planar targets (circular discs, rectangular plates), rotary/cylindrical targets, and custom-machined complex target configurations compatible with standard PVD systems, including Applied Materials, MRC, and Evatec equipment.
    Q: How do target density and grain size affect thin-film sputtering quality?
    A: Our titanium targets feature a fully dense microstructure (>99.5% theoretical density) and fine, uniform grain size (<50 μm). This ensures ultra-low arcing, reduced particle generation, and consistent deposition rates throughout the target lifetime.
    Q: Do you offer copper backing plate bonding services for titanium targets?
    A: Yes, we provide full target assembly services, including high-purity oxygen-free copper (OFC) backing plates and specialized elastomer or indium bonding to ensure superior thermal conductivity and mechanical stability under high power sputtering.
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